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Стр. 1304
REPORTS Bond Selectivity in Silicon Film Growth material was deposited over a period of 5 s followed by a 50 - s exposure to hydrogen atoms . Note that the conditions during the deposition cycle are identical to those used in the growth ...
REPORTS Bond Selectivity in Silicon Film Growth material was deposited over a period of 5 s followed by a 50 - s exposure to hydrogen atoms . Note that the conditions during the deposition cycle are identical to those used in the growth ...
Стр. 1305
Average thickness of material deposited per growth cycle as a function of the duration of the hydrogen exposure cycle for a series of different substrates : Al ( 1 ) , C - Si ( O ) , SiO2 ( O ) , and c - Al2O , ( O ) .
Average thickness of material deposited per growth cycle as a function of the duration of the hydrogen exposure cycle for a series of different substrates : Al ( 1 ) , C - Si ( O ) , SiO2 ( O ) , and c - Al2O , ( O ) .
Стр. 1537
Par Slow Crack Growth in Single - Crystal Silicon in Proceed Conference , 1978 ( AmerYork , 1978 ) , En , ibid . , pp . T. Guza , J Battjes and 388 ) . J. A. Connally and S. B. Brown Time - dependent crack growth has been measured on a ...
Par Slow Crack Growth in Single - Crystal Silicon in Proceed Conference , 1978 ( AmerYork , 1978 ) , En , ibid . , pp . T. Guza , J Battjes and 388 ) . J. A. Connally and S. B. Brown Time - dependent crack growth has been measured on a ...
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